Eyevex Respirator Chemical Cartridge For Half Mask ABEK1
Double Filter Chemical Cartridge for Half Mask
Processing with the presence of acids, Sulphur , hydrochloric acid , amonia and derivativates.
Particle Filters: for Half and full masks are divided into three classes depending on how effecively they can separate dust , Color code - White
Protection classes with respect to efficiency.
P1 R/NR Solid & Wet Particles 1 80%
P2 R/NR Solid & Wet Particles 1 94%
P3 R/NR Solid & Wet Particles 1 99.5%
|Filter Type||Portect Against||Colour Code|
|A||Organic gases/Vapours with a boiling point above 65°C eg. solvent naptha, toluene, styrene & xylene|
|B||Inorganic gases/vapours such as chlorine Hydrogen cynide and hydrogen sulpide|
|E||Acidic gases/vapours such as sulphur dioxide and formic acis|
|K||Amonia and certain amines|
|ABEK||Should be applicable for all above gases|
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